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博学堂讲座预告(第462讲)

编辑:admin 时间:2019年10月10日 访问次数:397

目: X-ray Photoelectron Spectroscopy (XPS) and its application in material surface and interface characterization


告摘要: X-ray Photoelectron Spectroscopy (XPS) is an extremely surface sensitive non-destructive technique that provides quantitative surface chemical state information for almost all elements. It is the most established and widely used surface analysis technique. In this presentation, firstly, I will give you some basic knowledge of XPS such as its physical basis, why is the XPS technique surface sensitive? Chemical shifts, quantification of XPS, etc. Secondly, I will show you the development of XPS instrumentation and some points in XPS measurement and data process such as charge compensation and referencing for insulators and spectral fitting. Finally, I will give you a review of its application in material surface and interface analysis. The review will be focused in determination of individual nanostructured features of materials and hetero-junction band offsets. Although many newly developing tools with high spatial resolution play important role in this analysis XPS is still considered as an essential tool for understanding several important aspects of nanostructured materials that cannot easily be observed using other techniques. But the question of how the nanostructured material features impact XPS data have been heavily debated in the scientific community, which limits its application in characterization of nanostructured materials. The performance of any type of hetero-junction device is determined by band energy alignment (band offsets) of material interfaces which form the hetero-junction. Therefore, accurately determining hetero-junction band offsets and tuning them to a desired application would have an obvious impact on the optimization of the devices. The effects of chemical shift, differential charging, band bending and photoemission final state on the XPS measurement accuracy and reliability will be discussed.


时间地点:20191015 下午14:00 A110


告人:潘冀生博士   新加坡科技研究局,材料研究与工程研究院资深研究员,并兼任新加坡国立大学物理系客座教授,博士生导师


告人:潘冀生博士,现任新加坡科技研究局,材料研究与工程研究院资深研究员,并兼任新加坡国立大学物理系客座教授,博士生导师。潘博士于1985年在杭州大学(现在浙江大学)物理系获学士学位;1988年获中国科学院上海应用物理研究所硕士学位;1998年获新加坡国立大学博士学位。其主要研究方向:高温等离子体和高压冷镀膜技术及其在航空发动机,汽车工业和防腐蚀方面的运用;二维材料和功能薄膜的生长,表征和在纳米,微米电子器件中的运用;改进了用x射线光电子能谱测量能差的方法;离子束表面改性和表面形貌的形成;表面和界面分析技术(X射线光电子能谱,俄歇电子能谱,二次离子质谱)在工业材料失效分析中的运用。到现在为止,潘博士在国际学术杂志上共发表文章280余篇,在国际学术会议上发表了100多次演讲。他也得到了很多奖项。例如,新加坡科技研究局航空研究项目杰出成就奖;新加坡合格评定国家认可委员会杰出评定员银奖;中国科学院自然科学三等奖;中国科学院优秀青年核工作者等。他也有许多社会兼职,包括新加坡合格评定国家认可委员会技术评定员;国际标准化组织(ISOTC201表面化学分析技术委员会新加坡分会委员;国际标准化组织(ISOTC229纳米技术委员会新加坡分会专家组成员;学术期刊《表面和界面分析》(Surface and Interface Analysis) 编辑; 学术期刊《科学报告》(Scientific Report)和《光谱学》编委。